A Comparative Review of Surface Characterization Techniques in Nanotechnology: Strengths, Limitations, and the Central Role of XPS
A Comparative Review of Surface Characterization Techniques in Nanotechnology
DOI:
https://doi.org/10.65137/tj.v28.167Keywords:
X-ray photoelectron spectroscopy (XPS), Surface characterization, Nanotechnology, Secondary ion mass spectrometry (SIMS), Auger electron spectroscopy (AES), Atomic force microscopy (AFM), Cryogenic XPSAbstract
In nanotechnology the character of the surface will play a critical role where material performance is determined by interfacial phenomena. This review assesses the performance of emerging trends in common surface analysis techniques, related to X-ray Photoelectron Spectroscopy (XPS) as this is the most widely used method in both science and engineering for a wide variety of nanomaterials because of its chemical specificity, quantitative accuracy, and relative ease of application. Other conventional approaches are assessed with respect to their merits and weaknesses. For the near-surface layer of a material, XPS provides unequaled insights into its elemental composition and chemical states. However, its use is limited by the need for a high vacuum, the need to neutralize surface charging, and spatial resolution restricted by the size of the smallest area being analysed. Comparative analysis shows the need to integrate XPS with complementary techniques for a complete characterisation. Current developments including cryogenic XPS, machine learning– assisted spectral analysis, and portable platforms suggest the increasing availability of in-situ and high-throughput studies. This review presents XPS as a major tool in the development of surface characterisation in nanotechnology.
